Characterization of Ion Concentration in Arc Plasma Seeded with SiO2 at Atmospheric Pressure
Authors: Anna Johansson, Martin Olsson, Sofia Bergström
DOI: 10.87349/JBUPT/27401
Page No: 1-05
Abstract
In this piece of study arc plasma was produced inside the vacuum chamber using dc power supply in order to measure the plasma parameter especially ion-concentration in arc plasma. Widely used moving Langmuir probes were successfully applied to measure the probe current at different values of the potential applied on the probe. The graph was plotted between the probe current and the probe potential, using the data obtained from the experimental set up of Double Probe Method (DPM) for the SiO2 arc plasma at atmospheric pressure. The ionconcentration was estimated to be in the range of 1.651018 to 4.711018ions m3, using the upper branch of the graph and range of 1.471018 to 4.271018 ions m3, using the lower branch of the graph.
